Stacey Bent from Stanford University joins the podcast to talk about Atomic Layer Deposition (ALD), a technique used to modify the composition and properties of surfaces. Since a large fraction of the atoms in nanostructures exist on the surface, ALD has become a quintessential tool for nanotechnologists. In this micro-episode, Stacey explains how ALD got its start, how it works, how the semiconductor industry accelerated its development, and what opportunities lie ahead.

Show details:
• Hosted by Michael Filler (@michaelfiller)
• Edited by Andrew Cannon (@andrewhcannon)
• Recorded on October 25, 2017
• Show notes are available at http://www.fillerlab.com/nanovation/archive/32
• Submit feedback at http://www.fillerlab.com/nanovation/feedback