In this episode, we dive into the atomic-scale frontier of semiconductor manufacturing. Join us as we unpack a cutting-edge review article exploring the trio of transformative technologies reshaping the industry: Atomic Layer Etching (ALE), Neutral Beam Etching (NBE), and Atomic Layer Deposition (ALD). These precision-driven processes are breaking the limits of traditional fabrication, enabling the creation of advanced devices like FinFETs and GaN-based electronics. From damage-free etching to ultra-thin conformal coatings, discover how these atomic-scale techniques are powering innovation beyond Moore’s Law in microelectronics, photonics, and beyond

Featured paper:

https://doi.org/10.1039/D4NA00784K