Bench Boost by Inorganic Ventures

Back to Basics – Plasma Fundamentals


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In this episode of Bench Boost, Ashley, Liv, and Mike delve into the fundamentals of how the plasma functions in ICP-OES and ICP-MS instruments. They explain the process of plasma interaction with sample aerosols, covering steps from desolvation to ionization. The discussion also includes the structure of plasma, its temperature variations, and how it can be manipulated by adjusting gas flow and RF power. They highlight the importance of ionization buffers and the differences between axial and radial viewing. The team concludes this week with an overview of cool plasma techniques in ICP-MS applications.

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Bench Boost by Inorganic VenturesBy Inorganic Ventures

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