When chip features shrink to a few nanometers, the alignment between layers becomes one of the hardest problems in manufacturing. In this episode, Lucas and Luna explore the quiet crisis of overlay error — how tiny shifts in lithography masks can destroy entire wafers, and how the industry is solving it with new metrology techniques and machine learning. Featuring the specific example of ASML's latest high-NA EUV tool and why its alignment accuracy is measured in picometers. A look at the unglamorous but critical physics behind every modern processor.

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