In this podcast episode, we discuss numerical aperture (NA) in EUV lithography - perhaps the most important lever for resolution and feature size on modern chips. We explain what NA means in physical terms, how it affects resolution and depth of field, and why the leap from “low NA” to “high NA” is a game changer for future technology nodes. We also highlight the impact of higher NA on scanner design, process windows, and cost per wafer - and why this directly influences the strategies of manufacturers such as ASML, Intel, and TSMC.

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