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[007] Deep Dive Topic - The CO2 Laser in EUV-Lithography
The CO2 laser, invented in 1964, is one of the most useful and highest-power continuous-wave gas lasers currently available, emitting in the infrared region (wavelengths centering on 9.6 and 10.6 micrometers (μm)). Traditionally, it is used in industrial applications for cutting, welding, and engraving, as well as in surgery for soft-tissue procedures.
Currently, the CO2 laser plays a decisive role in EUV lithography for manufacturing the latest generation of microchips. The TRUMPF Laser Amplifier is a pulsed CO2 laser system that strikes 50,000 tin droplets per second inside a vacuum chamber. This process creates an intensive plasma, which emits Extreme Ultraviolet (EUV) radiation with an optimal wavelength of 13.5 nanometers.
Components such as the High Power Seed Module (HPSM) are essential for optimally shaping the pulses and ensuring the commercial viability of EUV technology.
ASML recently honored TRUMPF for a new EUV high-energy laser that is scheduled for series production starting in 2026. This laser is intended to increase the availability and power of the EUV products while contributing to lower energy consumption.
This article was created with the help of AI. AI can make mistakes. Please verify the information if you intend to use it as a basis for your decision-making.
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By EUV The Focal Point - TeamThe CO2 laser, invented in 1964, is one of the most useful and highest-power continuous-wave gas lasers currently available, emitting in the infrared region (wavelengths centering on 9.6 and 10.6 micrometers (μm)). Traditionally, it is used in industrial applications for cutting, welding, and engraving, as well as in surgery for soft-tissue procedures.
Currently, the CO2 laser plays a decisive role in EUV lithography for manufacturing the latest generation of microchips. The TRUMPF Laser Amplifier is a pulsed CO2 laser system that strikes 50,000 tin droplets per second inside a vacuum chamber. This process creates an intensive plasma, which emits Extreme Ultraviolet (EUV) radiation with an optimal wavelength of 13.5 nanometers.
Components such as the High Power Seed Module (HPSM) are essential for optimally shaping the pulses and ensuring the commercial viability of EUV technology.
ASML recently honored TRUMPF for a new EUV high-energy laser that is scheduled for series production starting in 2026. This laser is intended to increase the availability and power of the EUV products while contributing to lower energy consumption.
This article was created with the help of AI. AI can make mistakes. Please verify the information if you intend to use it as a basis for your decision-making.