A mirror inside ASML's EUV lithography machine reflects just 70% of the EUV light it receives. With 10-12 reflections in the machine, this can get inefficient. Just 1% of the photons hit the wafer. Electrical power efficiency is said to be less than 0.2%. It also contributes to troublesome stochastic defects, since not enough EUV photons hit the resist to overcome quantum effects. So a recent paper from Professor Tsumoru Shintake at the Okinawa Institute of Science & Technology caught my eye. It proposes a simplified setup with radically fewer mirrors. But Shintake makes it clear to me that his system no way challenges ASML's. In fact, it should complement it. I think this thing can work. In today’s video, I want to walk you through this interesting new thing cooking up in beautiful Okinawa.